Weekly Semiconductor Fab Performance Summary

Track and analyze key semiconductor fabrication facility performance metrics focusing on yield, throughput, equipment effectiveness, and quality control to optimize manufacturing operations and maintain production targets.

Report Objective

Monitor and evaluate semiconductor fabrication facility performance across critical operational dimensions including production yield, equipment utilization, cycle time, and defect rates. This weekly analysis supports rapid identification of process deviations and manufacturing efficiency opportunities.

Production Yield and Output

Line chart showing weekly die yield percentage and wafer starts.

Questions to Consider:

2024-12-012025-01-012025-02-01week9150.0%9200.0%9250.0%9300.0%die_yielddie_yieldHow is Weekly Die Yield Trending?Die yield showing week-over-week variations with target comparison
  • What is the overall trend in die yield over the past quarter?

  • Are there any systematic patterns in yield fluctuations?

  • How does current yield compare to historical averages?

  • How stable is our weekly production volume?

  • Are we meeting planned wafer start targets?

  • What is the relationship between starts and yield?

2024-12-012025-01-012025-02-01week01,0002,0003,000wafer_startswafer_startsWeekly Wafer Start Volume AnalysisProduction volume trends showing fab loading patterns

Equipment Performance

Bar chart displaying equipment availability and OEE metrics

Questions to Consider:

LithographyEtchImplantCVDtool_group0.0%50000.0%100000.0%150000.0%200000.0%sum(availability)sum(availability)Tool Group Availability ComparisonEquipment availability across major tool groups
  • Which tool groups are showing the lowest availability?

  • How does availability impact overall fab performance?

  • Are maintenance schedules effectively maintaining availability?

  • Which tool groups have the lowest OEE?

  • How does OEE correlate with production bottlenecks?

  • What are the primary factors affecting OEE performance?

LithographyEtchImplantCVDtool_group0.0%50000.0%100000.0%150000.0%200000.0%sum(oee)sum(oee)Overall Equipment Effectiveness by Tool GroupOEE performance across different process areas

Quality and Defect Analysis

Scatter plot of defect density and critical dimension variation

Questions to Consider:

0.100.200.300.40defect_density2.04.06.0cd_variationDefect Density vs Critical Dimension VariationCorrelation between key quality metrics
  • Is there a correlation between defect density and CD variation?

  • Which products or lots show concerning quality patterns?

  • Are process controls effectively maintaining quality targets?